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ChE 189 Special Topics in Materials Processing
9 units (3-0-6); third term

Prerequisites: ChE 63, ChE 103, or equivalent. Fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in electronic materials processing. Basic plasma equations and equilibrium. Plasma and sheath dynamics. Gas-surface interactions. Plasma diagnostics and monitoring. Plasma-assisted etching and deposition in integrated circuit fabrication. Instructor: Giapis. Given in alternate years; offered 2007-08.